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2. Á÷¹« ¿ª·®À» ±â¸£±â À§ÇÑ °æÇèµé

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Àú´Â ¹ÝµµÃ¼ °øÁ¤ Áß¿¡ lithography¿¡ ´ëÇØ °¡Àå °ü½ÉÀÌ ¸¹¾Æ¼­ À¯Æ©ºê³ª ¿©·¯ ±â»ç¸¦ ÀÐÀ¸¸ç °øºÎÇß½À´Ï´Ù. Lithography °úÁ¤¿¡¼­ EUV Àåºñ¿¡ »ç¿ëµÇ´Â ±¤¿øÀÇ Èí¼ö¼ºÀÌ ³ô´Ù´Â Ư¼º°ú ±âÁ¸ÀÇ ¹æ½ÄÀ¸·Î´Â Àåºñ°¡ ÀÛµ¿ÇÒ ¼ö ¾øÀ½À» ¾Ë¾Ò½À´Ï´Ù. À̸¦ °è±â·Î EUV Àåºñ¿¡ È£±â½ÉÀ» °®°í °ü·Ã ±â»ç¸¦ ÂüÁ¶ÇÏ¿© °øºÎÇß°í, ·»Áî°¡ ¾Æ´Ñ ¹Ý»ç°æÀÌ »ç¿ëµÇ°í ±âÁ¸ÀÇ Àåºñº¸´Ù ÈξÀ Á¤¹ÐÇÏ°í º¹ÀâÇÑ °úÁ¤À¸·Î µ¿ÀÛÇÑ´Ù´Â °ÍÀ» ¾Ë¾Ò½À´Ï´Ù. ´õ ³ª¾Æ°¡ High NA EUV Àåºñ¿¡¼­ NA °ªÀº ¹Ý»ç°æÀÇ Å©±â¿¡ ºñ·ÊÇÏ¿© Áõ°¡Çϸç NA°¡ Áõ°¡ÇÒ¼ö·Ï ´õ¿í ¼±¸íÇÏ°í ¹Ì¼¼ÇÑ È¸·Î¸¦ ¸¸µé ¼ö ÀÖ´Â °ÍÀ» ¾Ë¾Ò½À´Ï´Ù. À̶§, ¹Ý»ç°æÀÌ Ä¿Áü¿¡ µû¶ó ¹ß»ýÇÏ´Â ¹Ý»ç±¤ÀÇ °£¼·À» ¸·±â À§ÇØ ¾Æ³ª¸ðÇÈ ±â¼úÀ» Á¢¸ñÇÑ °Íµµ ¾Ë°Ô µÇ¾ú½À´Ï´Ù.
ÀÌó·³ ¹ÝµµÃ¼¿¡ ´ëÇÑ ÀÌ·ÐÀ» ÇнÀÇÑ Àú´Â Á÷Á¢ FAB¿¡ µé¾î°¡ ¹ÝµµÃ¼ °øÁ¤À» °æÇèÇϱâ À§ÇØ ¼­¿ï´ëÇб³¿¡¼­ 2ÁÖ µ¿¾È ¹ÝµµÃ¼ °øÁ¤ ½Ç½ÀÀ» Çß½À´Ï´Ù. ¹ÝµµÃ¼ Çö¾÷¿¡¼­ Á÷Á¢ ¾²ÀÌ°í ÀÖ´Â ¿©·¯ ÀåºñµéÀ» º¸¸ç, 8´ë °øÁ¤ Àü¹ÝÀ» Á÷Á¢ È®ÀÎÇÒ ¼ö ÀÖ¾ú½À´Ï´Ù.





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3. ÀÔ»ç ÈÄ Æ÷ºÎ

Àú´Â ³¸À» °¡¸®Áö ¾Ê¾Æ óÀ½ º» »ç¶÷¿¡°Ô Àß ´Ù°¡°¡´Â ¼º°ÝÀ» °®°í ÀÖ½À´Ï´Ù. ¸ÕÀú ´Ù°¡°¡´Â ¼º°Ý ´ö¿¡ ¿©·¯ »ç¶÷À» °ÞÀ» ¼ö ÀÖ¾ú°í, »ç¶÷µé¸¶´Ù ¾î¶»°Ô ´Ù°¡°¡¾ß ÇÒÁö¿¡ ´ëÇÑ Àú¸¸ÀÇ ¹æ¹ýµµ »ý°å½À´Ï´Ù. ¶ÇÇÑ Àú´Â Ä£ÇØÁø ÀÌÈÄ¿¡µµ dzºÎÇÑ ¸®¾×¼Ç°ú Àß µé¾îÁÖ´Â ¸ð½À ´ö¿¡ »ç¶÷µé°úÀÇ ÀÇ»ç¼ÒÅë ´É·Âµµ ÁÁ½À´Ï´Ù.
ÀúÀÇ ÀÌ·¯ÇÑ ¼º°ÝÀº ASMLÀÇ CS ¿£Áö´Ï¾î·Î¼­ ÀÏÇÒ ¶§ Àß ¹ßÈÖµÉ ¼ö ÀÖÀ» °ÍÀÔ´Ï´Ù. CS ¿£Áö´Ï¾î·Î ÀÏÇϸé Àμö Áغñ ¹× Çù·Â ¾÷ü¸¦ ÄÁÆ®·Ñ ÇØ¾ß ÇÏ´Â ¿ªÇÒÀ» ¼öÇàÇØ¾ß ÇϹǷΠº»»ç, °í°´, Çù·Â ¾÷üµé°ú ÀÇ»ç¼ÒÅëÇØ¾ß ÇÏ´Â ÀÏÀÌ ÀæÀ» °ÍÀÔ´Ï´Ù. »ç¶÷À» »ó´ëÇØ¾ß ÇÏ´Â ÀÏÀÌ ¸¹Àº ¸¸Å­ Á¦ ƯÀ¯ÀÇ Ä£±ÙÇÔÀ» »ì·Á¼­ ´Ù°¡°£´Ù¸é »ó´ëÇϱ⠻ó´ë¶óµµ Àú¸¸ÀÇ ¹æ¹ýÀ¸·Î À¯¿¬ÇÏ°Ô ´ëóÇÒ ¼ö ÀÖÀ» °ÍÀÔ´Ï´Ù.
Àú´Â ´ë±â¸¸¼ºÇüÀÔ´Ï´Ù. óÀ½¿¡´Â ½Ç¼ö°¡ ÀÖ´õ¶óµµ ¾î¶»°Ôµç ³¡±îÁö ¹è¿ì°í ¼ºÀåÇÏ·Á´Â ²ö±â°¡ ÀÖ½À´Ï´Ù. ÀÔ»ç ÈÄ¿¡µµ ³ë±¤ Àåºñ¿¡ ´ëÇÑ Áö½ÄÀº ¹°·Ð ¾îÇÐ ´É·Â, ü·Â µî ¿©·¯ ¹æ¸é¿¡¼­ ´õ¿í ¹ßÀüÇÏ¿© ²À ASML¿¡ µµ¿òÀÌ µÇ´Â CS ¿£Áö´Ï¾î·Î ¼ºÀåÇÏ°Ú½À´Ï´Ù.


1. Why ASML?

ASML is the only manufacturer of EUV lithography equipment in the world. Lithography is the process of drawing semiconductor circuit patterns on the wafer using light, which is the most important process because it directly affects quality and performance.
I learned the importance of exposure process by taking semiconductor process classes in third grade, and I saw lithography process equipment for the first time while practicing semiconductor process. The equipment used at this time used an i-line light source. The process of lithography with this equipment was interesting, and this made me more curious about ASMLs EUV equipment which is better technology.
Currently, ASML has such a strong influence that how much equipment ASML produces changes the companys share. Although ASML is already unique in the world, it has continued to challenge itself beyond the limits of technology and is currently developing High NA EUV equipment.
The title "Unrivaled" is not something that anyone can have. Therefore, I applied because I wanted to become a CS engineer of ASML and continue to lead ASML.

2. Experiences to develop job competence

Based on the understanding of semiconductor facilities, ASML engineers should install ASML equipment and continuous monitoring and provide correct solutions when problems arise with customer¡®s equipment. Therefore, I developed the necessary capabilities through the following experience.


In order to develop semiconductor-related capabilities, I took semiconductor-related major classes such as physical electronics, solid electronics, and semiconductor process, and learned the characteristics and operating principles of basic semiconductor devices and semiconductor process. In addition, I read articles related to semiconductors to know the semiconductor industry and participated in the semiconductor fair held at COEX, and studied about semiconductors steadily.
I was most interested in lithography during the semiconductor process, so I studied by watching YouTube and reading various articles. During the lithography process, we found that the light sources used in EUV equipment were highly absorbent and that the equipment could not be operated in a conventional manner. As a result, I was curious about EUV equipment and studied by referring to related articles, and found that reflectors were used instead of lenses, and operated in a much more precise and complex process than conventional equipment. Furthermore, we found that in High NA EUV equipment, the NA value increases in proportion to the size of the reflector, and as the NA increases, a clearer and finer circuit can be created. At this time, I also learned that anamorphic technology was applied to prevent interference of reflected light generated by the larger reflector.
After learning the theory of semiconductors like this, I entered the FAB and practiced semiconductor process for two weeks at Seoul National University to experience semiconductor process. Looking at the various equipment used in the semiconductor field, I was able to directly check the overall eight processes.



When I was a college student, I had a part-time job that gave feedback after using a camera app that was being developed by a company. The camera app that the company was developing was to allow users to select their own avatars and combine them with the background they filmed.
However, when the company pre-released the app, the usage rate of those in their 10s and 20s, who were the main customer base, was low. Most of the responses were that there was nothing unusual about the app except that it used avatars, and that the appearance of avatars was out of date. Therefore, the company wanted me to tell about the improvement points of the app so that the usage rate of consumers in their teens and 20s could be increased.
I suggested a new way to remove the avatar from the existing way of using the avatar and decorate it naturally by writing stickers or writings on the picture. Also, for objective comparison, we used Naver form to survey about 100 anonymous people. As a result, the app that changed according to the feedback I gave was the most responsive when people actually used it.

3. My strong points and Plans after joining

Im not shy person, so I have a personality that approaches people for the first time. I was able to experience many people because of my personality to approach first, and I had my own way of approaching each person. Also, I have good communication skills with people thanks to my abundant reactions and listening to them even after I got close.
This personality will be able to be displayed well when I work as an ASMLs CS engineer. If I work as a CS engineer, I will often have to communicate with the headquarters, customers, and partners because I have to prepare for the acquisition and control the partners. As I have a lot of work to do with people, if I approach them with my unique friendliness, even customers who are difficult to deal with will be able to respond flexibly in my own way.
I am a late bloomer. At first, even if I make mistakes, I have the perseverance to learn and grow to the end. Even after joining the company, I will develop my knowledge of lithography equipment as well as language skills and physical strength and grow into a CS engineer who is helpful in ASML.

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